Lam Research Unveils Industry's Most Advanced Conductor Etch Technology to Date

Core Insights - Lam Research Corp. has introduced Akara, an advanced conductor etch tool designed for 3D chipmaking, which enhances etch precision and performance [1][3] - Akara builds on over 20 years of Lam's leadership in conductor etch technology, succeeding the Kiyo etch tool with over 30,000 chambers in production [2][3] - The new tool is essential for scaling gate-all-around (GAA) transistors and advanced memory devices, requiring precise etch steps and EUV lithography [4][5] Product Features - Akara utilizes Lam's proprietary DirectDrive technology, achieving plasma responses that are 100 times faster, enabling atomic-scale feature creation [3][9] - The tool is designed for high-volume production, optimizing wafer output with millisecond response times and ensuring uniformity across wafers [6] - Integrated with Lam's Sense.i platform, Akara employs Equipment Intelligence solutions for automated maintenance, enhancing overall equipment efficiency [6] Market Validation - Leading device manufacturers have selected Akara as the production tool of record for advanced DRAM and GAA applications, indicating strong market demand [7] - The introduction of Akara, alongside the ALTUS Halo tool, reflects Lam's commitment to innovation in response to evolving semiconductor industry needs [8]