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光刻胶概念下跌1.60%,7股主力资金净流出超5000万元
Zheng Quan Shi Bao Wang·2025-05-28 08:29

Market Performance - The photoresist concept sector declined by 1.60%, ranking among the top declines in the concept sector as of the market close on May 28 [1] - Within the sector, stocks such as Guofeng New Materials, Xilong Science, and Kent Catalysts experienced significant declines, while 16 stocks saw price increases, with Ruile New Materials, Tongcheng New Materials, and Aolaide leading the gains at 5.08%, 2.99%, and 2.74% respectively [1] Capital Flow - The photoresist concept sector experienced a net outflow of 1.135 billion yuan, with 51 stocks seeing net outflows, and 7 stocks having outflows exceeding 50 million yuan [2] - The stock with the highest net outflow was Kaimete Gas, with a net outflow of 274 million yuan, followed by Hongbaoli, Feikai Materials, and Guofeng New Materials with net outflows of 198 million yuan, 115 million yuan, and 79.89 million yuan respectively [2] Top Gainers and Losers - The top gainers in the photoresist concept stocks included Tongcheng New Materials, Ruile New Materials, and Qicai Chemical, with net inflows of 37.81 million yuan, 36.54 million yuan, and 30.98 million yuan respectively [2][4] - The stocks with the largest declines included Kaimete Gas at -3.90%, Hongbaoli at -5.13%, and Feikai Materials at -4.16% [3][4]