面向新一代信息技术应用的铁电薄膜与器件专题论坛召开

Core Viewpoint - The forum on ferroelectric thin films and devices, focusing on applications in next-generation information technology, gathered nearly a hundred experts from academia, research, and industry to discuss recent advancements and future directions in the field [1]. Group 1: Forum Overview - The event was organized by the China Association for Science and Technology and hosted by the Chinese Society of Silicate [1]. - The forum featured two main segments: keynote presentations and discussion sessions [1]. - High-level participation included 13 experts presenting on the latest research progress, core challenges, and future development directions of ferroelectric thin film materials and devices [1]. Group 2: Discussion Topics - The discussion was moderated by Academician Nan Cewen, focusing on three main topics: preparation, characterization, design, and simulation of ferroelectric thin films; applications of ferroelectric thin films in information devices; and new systems of ferroelectric thin films and two-dimensional ferroelectric materials [1]. - Participants engaged in open discussions, leading to innovative ideas and insights through intellectual exchanges [1].