Core Insights - Pulin Technology announced the successful delivery of its self-developed PL-SR series inkjet stepper nano-imprinting equipment, marking a significant milestone in China's high-end semiconductor equipment manufacturing sector, breaking the foreign monopoly in this field [1][2] - The PL-SR series has achieved breakthroughs in several key technologies, including non-vacuum complete bonding of step hard boards, glue spraying and thin glue imprinting, and control of residual imprint glue layers, supporting nano-imprinting lithography processes with line widths smaller than 10nm, surpassing Canon's FPA-1200NZ2C which supports 14nm line widths [1] - Compared to traditional EUV lithography technology, nano-imprinting technology reduces equipment investment costs by 60% and limits power consumption to 10% of that of EUV technology, providing a new technological path for domestic storage chip manufacturers to overcome process bottlenecks [1] Industry Implications - The successful delivery of the PL-SR series not only breaks the technology blockade imposed by Canon but also provides crucial equipment support for China's semiconductor industry chain to achieve self-sufficiency [2] - While nano-imprinting technology still faces efficiency bottlenecks in complex logic chip manufacturing, it has shown potential as a substitute in specific areas such as storage chips, which may enhance the market competitiveness of domestic manufacturers [2]
国产半导体装备重大突破!璞璘科技纳米压印设备交付客户
Ju Chao Zi Xun·2025-08-05 14:06