国林科技：关于半导体臭氧设备是否更适合于EUV光刻配套，业内处于工艺研究与试验中

Group 1 - The company responded to an investor inquiry regarding the suitability of semiconductor ozone equipment for EUV lithography, indicating that it is a future development trend from a technical perspective [2] - The industry is currently in the stage of process research and experimentation regarding this technology [2]