汇成真空：公司HiPIMS高功率脉冲磁控溅射设备在TGV深孔沉积领域具有高离化率等优势和特点

Group 1 - The company, Huicheng Vacuum (301392), highlighted the advantages of its HiPIMS high-power pulsed magnetron sputtering equipment in the TGV deep hole deposition field, which includes high ionization rate, low duty cycle control, and dense uniform film formation [1]