Advantest Introduces Advanced Mask CD-SEM “E3660”

Core Insights - Advantest Corporation has launched its next-generation CD-SEM E3660, designed for the dimensional metrology of photomasks and EUV masks, achieving over a 20% improvement in CD reproducibility compared to the previous E3650 model [1][4] - The E3660 is positioned to support advanced mask R&D and production environments, particularly in Merchant and Captive Mask Shops, establishing itself as a core evaluation tool for mask development [5][6] Industry Trends - The semiconductor industry is experiencing increased complexity in lithographic patterns, leading to a rise in lithographic hotspots and a demand for higher throughput and reproducibility in measurement systems [2] - The transition towards curvilinear mask patterns is anticipated to be significant by 2027, necessitating advanced metrology solutions that can accurately measure complex geometries and ensure design-to-mask fidelity [3] Collaboration and Development - Advantest collaborated with imec to validate the E3660's performance, enhancing metrology reliability and developing new measurement techniques for curvilinear geometries [4] - The E3660 incorporates curvature-sensitive algorithms to quantify deviations between complex mask features and original design intent, reflecting the outcomes of this collaboration [3][4]