Lam Research Teams Up With JSR: Can it Lead in High-NA EUV?

Key Takeaways LRCX and JSR will pair Aether dry resist with advanced metal oxide resists to enable high-NA EUV.The partnership aims to cut cost and complexity in chip patterning while boosting performance.Success in high-NA EUV could expand LRCX's share in foundry and logic at sub-2nm chip nodes.Lam Research ((LRCX) has signed a new cross-licensing and collaboration deal with JSR Corporation, the parent company of Inpria, to push forward next-generation chip patterning. The agreement is aimed at combining L ...