新型光刻胶制备方法开发成功

Core Viewpoint - An international research team led by Professor Zhuang Liwei from East China University of Science and Technology and Professor Michael Saphir from Johns Hopkins University has developed a method for preparing amorphous zeolitic imidazolate framework (aZIF) films using intermittent spin-coating chemical liquid phase deposition, achieving controllable deposition rates and thicknesses [1] Group 1 - The aZIF films have been utilized as advanced photoresists, and the ability to prepare large-area, high-precision aZIF films is significant for advanced lithography processes [1] - The research team proposed a new method for aZIF film preparation based on previous strategies involving ultra-dilute precursor solutions, revealing intrinsic deposition rates and key factors affecting film uniformity through a series of experiments and simulations [1] - Various aZIF films were prepared using the chemical liquid phase deposition method, including zinc/2-methylimidazole, zinc/benzoimidazole, zinc/4,5-dichlorimidazole, and cobalt/2-methylimidazole, with testing conducted on their patterning performance as positive and negative photoresists [1]