光刻胶领域，我国取得新突破

Core Insights - Lithography technology is a key driver for the continuous miniaturization of integrated circuit chip manufacturing processes [1] - A research team led by Professor Peng Hailin from Peking University has successfully utilized cryo-electron tomography to analyze the microscopic three-dimensional structure, interfacial distribution, and entanglement behavior of photoresist molecules in a liquid phase environment [1] - The findings guide the development of an industrialization plan that significantly reduces lithography defects, as published in the journal Nature Communications [1]