国内团队破解芯片光刻缺陷难题？研究者回应一财

Core Viewpoint - The article emphasizes the need for early investment in extreme ultraviolet (EUV) photoresist technology to catch up with international peers in the semiconductor industry [8]. Group 1: Research Breakthroughs - A research team led by Professor Peng Hailin from Peking University has made significant advancements in the field of photoresist, utilizing cryo-electron tomography (Cryo-ET) to analyze the micro-3D structure and behavior of photoresist molecules in liquid environments [1][4]. - The study published in Nature Communications indicates that the proposed method can achieve over 99% improvement in reducing pattern defects in lithography processes [1][5]. Group 2: Technical Insights - The research reveals that the behavior of photoresist in developing solutions has been poorly understood, leading to trial-and-error approaches in the industry, which hampers the optimization of advanced manufacturing processes [3][4]. - The study suggests that suppressing polymer entanglement during the development process is crucial for mitigating surface defects, with an optimal post-exposure bake (PEB) temperature of 105°C recommended to facilitate polymer disentanglement [4][5]. Group 3: Market Context - The global semiconductor photoresist market is projected to grow from approximately $2.685 billion in 2024 to $4.547 billion by 2031, indicating a significant opportunity for domestic companies to enhance their market presence [8]. - Major players in the photoresist market include Tokyo Ohka Kogyo, JSR, and Shin-Etsu Chemical, predominantly from Japan, the U.S., and South Korea, with the top five companies holding about 86% of the market share in 2023 [8]. Group 4: Future Directions - The article highlights the importance of collaboration between industry and academia to address manufacturing defects in semiconductor production, with a call for domestic researchers to focus on EUV photoresist development to keep pace with international advancements [8]. - Recent achievements in photoresist research from various Chinese universities indicate a growing capability in the field, with ongoing efforts to transition research outcomes into practical applications [7].