北大光刻胶领域研究取得新突破

Core Insights - Lithography technology is a key driver for the continuous miniaturization of integrated circuit chip manufacturing processes [1] - A research team led by Professor Peng Hailin from Peking University has utilized cryo-electron tomography to analyze the microscopic three-dimensional structure and entanglement behavior of photoresist molecules in a liquid phase, leading to a significant reduction in lithography defects [1] - The findings were published in the journal Nature Communications, highlighting the importance of this research in advancing semiconductor manufacturing [1] Summary by Sections - Lithography Process: The development of photoresist is crucial for the lithography process, where the developer dissolves the exposed areas of the photoresist to accurately transfer circuit patterns onto silicon wafers [1] - Challenges in the Industry: The microscopic behavior of photoresist in the developer has been a "black box," limiting process optimization to trial and error, which has been a bottleneck for improving yield in advanced processes below 7nm [1] - Innovative Techniques: The research team introduced cryo-electron tomography to the semiconductor field, achieving a three-dimensional "panoramic photo" with a resolution better than 5nm, overcoming traditional observational limitations [1] - Implications for Semiconductor Manufacturing: Understanding the structure and microscopic behavior of polymers in liquid can enhance defect control and yield improvement in critical processes such as lithography, etching, and wet cleaning [1]