社评：中国科技进步，路透社本不必焦虑

Group 1 - The article discusses China's advancements in technology, particularly the development of a prototype extreme ultraviolet (EUV) lithography machine, which has been a focus of concern for Western nations [1] - The EUV lithography machine is considered a critical technology, with only ASML from the Netherlands currently able to produce it, highlighting China's historical reliance on imports for high-end equipment [1] - China's domestic development of deep ultraviolet (DUV) lithography machines has shown progress, with official specifications released indicating a resolution of 65 nanometers and overlay accuracy of 8 nanometers [1] Group 2 - The article emphasizes the importance of international cooperation in the semiconductor industry, especially for complex systems like lithography machines, which require collaboration among multiple countries [2] - Despite breakthroughs in lithography technology, the nature of the semiconductor industry remains unchanged, and China recognizes the need for open international collaboration [2] - China's commitment to technological self-reliance does not hinder its willingness to cooperate internationally, as evidenced by successful partnerships in various fields [2] Group 3 - The article argues that technology should serve the global community and that restrictive measures against China ultimately harm the global tech industry, including Western interests [3] - It highlights that over 30% of high-impact research projects in the U.S. involve Chinese scientists, indicating the significance of U.S.-China collaboration for technological progress [3] - The article calls for a shift away from fear and hegemony towards open cooperation to share the benefits of technological advancements and address global challenges [3]