突破“后摩尔”极限：国内首条二维半导体工程化示范线在沪“点亮”

Group 1 - The core point of the article highlights the launch of China's first engineering demonstration line for two-dimensional semiconductors by Yuanjiwei Technology in Shanghai, marking a significant step in the transition from laboratory research to industrialization in the field of non-silicon heterogeneous integration technology [1][2] - The semiconductor industry is entering a "post-Moore era" with advanced processes of 2 nanometers and below, where the physical limits of silicon materials are becoming a bottleneck for further computational power advancements [1] - Two-dimensional semiconductors are recognized as revolutionary materials for the next generation of integrated circuits, offering unique physical properties such as atomic-level thickness and ultra-high carrier mobility, with important applications in high-frequency communication, flexible electronics, quantum computing, and edge intelligence [1] Group 2 - The engineering demonstration line aims to achieve the industrialization of two-dimensional semiconductor materials by integrating mainstream semiconductor manufacturing equipment, thereby shortening the cycle from research results to industrial application [2] - The production line is expected to officially "go live" by June 2026, completing all equipment linkage debugging and process optimization, and running the wafer process [2] - Shanghai is positioning two-dimensional semiconductors as a key focus for future industrial development, with systematic deployment around critical areas such as material production, manufacturing processes, device design, and equipment [2]