佛山禾邦新材料科技申请用于SiC晶片的耐磨聚氨酯抛光层专利

Core Viewpoint - The article discusses a patent application by Foshan Hebang New Materials Technology Co., Ltd. for a wear-resistant polyurethane polishing layer specifically designed for SiC wafers, addressing compatibility issues between reinforcing fillers and the polyurethane matrix [1] Group 1: Patent Details - The patent titled "A Wear-Resistant Polyurethane Polishing Layer for SiC Wafers and Its Preparation Method and Application" has a publication number CN121343177A and was applied for on October 2025 [1] - The patent aims to solve the problem of poor compatibility between reinforcing fillers and the polyurethane matrix in existing polyurethane polishing pads, which leads to reduced wear resistance [1] Group 2: Composition and Benefits - The polishing layer includes modified reinforcing filler grafted polyurethane prepolymer, where the modified reinforcing filler consists of reinforcing filler and modifying substances [1] - By modifying the reinforcing filler, the compatibility of the filler within the polyurethane matrix is significantly increased, enhancing thermal and chemical stability and preventing precipitation at high and low temperatures [1] - The innovation also eliminates sliding between the filler and resin, resulting in superior wear resistance [1]