应用材料公司取得用于选择性间隙填充的低温等离子体预清洁专利

Group 1 - The core point of the article is that Applied Materials has obtained a patent for a technology related to "low-temperature plasma pre-cleaning for selective gap filling" [1] Group 2 - The patent was granted with the announcement number CN114930520B and the application date was June 2021 [1]