应用材料公司取得提高选择性外延生长速率专利

Core Viewpoint - The State Intellectual Property Office of China has granted a patent to Applied Materials for a method to increase the growth rate of selective epitaxial growth, with the announcement number CN114551229B and an application date of March 2016 [1] Group 1 - The patent focuses on enhancing the growth rate of selective epitaxial growth, which is significant for semiconductor manufacturing [1] - The patent was officially granted after a lengthy application process that began in March 2016 [1]