AMEC(SH:688012) Zheng Quan Ri Bao Zhi Sheng·2026-01-23 13:43Core Viewpoint - The company emphasizes its commitment to technological innovation and differentiation in the plasma etching equipment market, aiming to maintain a leading edge in technology and meet customer demands [1]. Group 1: Technological Development - The company has developed a complete series of 20 types of plasma etching equipment over the past 20 years, accumulating extensive production line data and customer validation data [1]. - The dual-reactor strategy of CCP and ICP etching machines has proven advantageous, effectively covering various technological nodes in process applications [1]. Group 2: Investment in Advanced Technology - The company is heavily investing in the research and validation of key etching equipment for advanced chip manufacturing technologies, with successful progress in customer production line validation for critical etching processes in logic and memory chip manufacturing [1]. - Some advanced models of CCP and ICP equipment have become the main models for critical processes in the production of advanced devices [1]. Group 3: Focus on High-End Equipment - The company continuously increases its investment in the development of high-end equipment necessary for the production of advanced devices, guided by the needs of the most advanced device manufacturing [1].