Core Viewpoint - The core difference between PSM (Phase Shift Mask) and ordinary BIM (Binary Mask) lies in the technology that enhances lithography resolution, with PSM being crucial for advanced processes at 90nm and below [1] Group 1: Technology Comparison - BIM operates on a binary structure of transparent (bright) and opaque (dark) areas, which can lead to optical interference at high-end processes, affecting precision [1] - PSM introduces a 180-degree phase shift in adjacent transparent areas, utilizing interference effects to significantly enhance contrast and resolution, particularly for smaller line widths and higher density in advanced chip manufacturing [1] Group 2: Industry Position - The company has established mature technological capabilities and mass production capacity in the PSM field, enabling it to meet customer demands for high-end nodes [1]
龙图光罩：PSM与普通BIM的核心区别在于其提升光刻分辨率的技术原理