Core Viewpoint - The company has successfully delivered a 12-inch high-temperature sulfuric acid cleaning equipment, which is crucial for advanced semiconductor processes and currently dominated by overseas suppliers [1] Group 1: Equipment Delivery and Specifications - The newly developed equipment meets the technical performance standards of overseas counterparts and features domestic leading and internationally competitive high-temperature control capabilities, covering cleaning processes up to 190℃ [1] - The equipment is designed with integration and compatibility in mind, offering flexible application configurations to provide customers with more competitive solutions [1] Group 2: Recent Orders and Client Engagement - Recently, the company has delivered five single-wafer cleaning devices to four clients, including an OCTOPUS device for a 12-inch wafer foundry client and both an OCTOPUS and a CUBE device for a high-performance analog and power device client [1] - Among the delivered orders, two were repeat orders from existing clients, and the company has also received a repeat order for an OCTOPUS device, which is set for delivery soon [1] - The revenue from these orders has not yet been recognized [1] Group 3: Future Plans - The company aims to continue fulfilling the orders for semiconductor cleaning equipment and leverage its technical team's advantages in semiconductor wet processing technology to expand the adoption of its equipment among high-quality semiconductor clients in key application areas [1]
普达特科技(00650)：成功向客户交付一台12英寸高温硫酸清洗设备