武汉十条新政重磅出台，这类“一人公司”可获百万元资助

Core Viewpoint - Wuhan Municipal Government has introduced a set of measures to support the innovation and development of Artificial Intelligence One-Person Companies (OPC), aiming to establish Wuhan as a national hub for OPC entrepreneurship by providing comprehensive support across ten dimensions including computing power, data, talent, and finance [1][2]. Group 1: Policy Measures - The measures will be effective from March 18, 2023, until December 31, 2028, focusing on nurturing new entrepreneurial entities in the "AI + super individual" model [1]. - OPCs can receive a subsidy of up to 200,000 yuan for computing power costs, with districts providing at least 2,000 computing hours of free power annually [2]. - Initial OPCs can obtain up to 1 million yuan in funding, and those settling in ecological communities can enjoy up to two years of free financial and legal services [2]. Group 2: Talent Support - OPC entrepreneurs renting talent housing will receive a rent exemption of up to 2,000 yuan per month for two years, with the third year capped at 70% of the market rate [2]. - Founders and executives of OPCs purchasing new residential properties in the city can receive a subsidy of up to 100,000 yuan, calculated at 1,000 yuan per square meter [2]. Group 3: Financial and Application Support - Eligible OPCs can access entrepreneurial guarantee loans of up to 5 million yuan for a maximum of two years [2]. - The city aims to identify at least 100 typical application scenarios for OPCs each year, with demonstration projects receiving up to 100,000 yuan in funding [2]. - Wuhan plans to establish over 10 OPC ecological communities by 2028, aiming to gather 5,000 OPC talents and incubate 500 OPC enterprises [2]. Group 4: Community Development - The construction of OPC ecological communities will focus on sectors such as smart healthcare, digital creativity, urban services, cybersecurity, industrial software, smart chips, and autonomous driving, promoting a differentiated and specialized development pattern [3].