Fujifilm to Present Latest Advanced Lithography Research at SPIE Advanced Lithography + Patterning 2026 Conference
Businesswire·2026-02-19 18:00
TOKYO--(BUSINESS WIRE)--FUJIFILM Corporation will present the company's latest research findings at SPIE Advanced Lithography + Patterning 2026 (SPIE 2026), taking place February 22-26, 2026, in San Jose, California. The international conference is organized by SPIE, the international society for optics and photonics. As part of its growth strategy aiming to double revenue in the semiconductor materials business to 500 billion yen (3.26B $USD) by FY2030 compared with FY2024, Fujifilm is focusin. ...