英特尔取得用于先进集成电路结构制造的鳍切口和鳍修整隔离专利
Jin Rong Jie·2026-02-24 06:31

Core Viewpoint - Intel has obtained a patent for "Fin Cut and Fin Trimming Isolation for Advanced Integrated Circuit Structure Manufacturing," which indicates ongoing innovation in semiconductor technology [1] Group 1 - The patent was granted with the announcement number CN109860179B [1] - The application date for the patent was November 2018 [1]

INTEL-英特尔取得用于先进集成电路结构制造的鳍切口和鳍修整隔离专利 - Reportify