又一高端光刻胶（KrF/ArF）项目验收

Core Viewpoint - The article discusses the recent acceptance announcement of Hangzhou Hanya Microelectronics Technology Co., Ltd.'s high-end photoresist new material project, highlighting its significance in the semiconductor industry and the company's ambitions in this field [1][3]. Group 1: Project Overview - The project involves an investment of 101.5 million yuan, aiming to produce 3 tons of high-end photoresist new materials annually, with completion expected in December 2024 and trial operations starting in January 2025 [2]. - The initial acceptance includes 2.62 tons of high-end photoresist materials, specifically 2.5 tons of KrF photoresist and 0.5 tons of ArF photoresist [2]. Group 2: Company Background - Hangzhou Hanya Microelectronics Technology Co., Ltd. was established in June 2023 in Qiantang District, Hangzhou, with a registered capital of 6.25 million yuan and has completed its Series A financing [3]. - The company aims to become the first domestic enterprise with commercial production capabilities for high-end deep ultraviolet photoresist KrF (248nm) and ArF (193nm) core resin materials, as well as next-generation EUV (13nm) extreme ultraviolet photoresist resin materials [3]. Group 3: Industry Context - Photoresists, also known as photoresist agents, are essential in semiconductor manufacturing, comprising components like photoinitiators, resins, monomers, solvents, and additives [4]. - The semiconductor photoresist market is categorized by exposure wavelength, including g-line (436nm), i-line (365nm), KrF (248nm), ArF (193nm), and EUV photoresists (13.5nm), with EUV photoresists currently being entirely imported [4]. - Domestic production of KrF and ArF photoresists has been achieved by several companies, but their market share remains low, with competitors including Nanda Optoelectronics, Jingrui Electric Materials, and others [4].