国产首台电子束光刻机！0.6nm！

Core Viewpoint - The article highlights the successful development and testing of China's first domestically produced commercial electron beam lithography machine, named "Xizhi," which aims to enhance the country's semiconductor industry and reduce reliance on foreign technology [2][4]. Group 1: Product Development - The "Xizhi" is a next-generation 100kV electron beam lithography machine, designed for quantum chips and new semiconductor research, achieving a precision of 0.6 nanometers and a line width of only 8 nanometers, comparable to international mainstream equipment [4]. - Unlike traditional lithography machines, the electron beam lithography machine offers unique advantages in prototype design, rapid iteration, and small batch production, significantly improving the efficiency of early-stage chip development [4]. Group 2: Market Impact - The introduction of "Xizhi" breaks the long-standing export control barriers that prevented domestic research institutions and enterprises from acquiring advanced electron beam lithography equipment, facilitating collaboration with various domestic companies and research institutions [4].