首台国产商业化电子束光刻机启动测试，为我国量子芯片研发添自主“利器”

Core Viewpoint - The successful launch of China's first commercial electron beam lithography machine "Xizhi" marks a significant breakthrough in quantum chip research, achieving a precision of 0.6 nanometers and a line width of 8 nanometers, thus breaking international restrictions on technology procurement [1][4][5]. Technological Breakthrough and Application Value - The "Xizhi" machine, developed by Zhejiang University’s Quantum Research Institute, operates at 100kV and is currently undergoing testing by teams from the University of Science and Technology of China and Zhejiang University [4]. - The development team likens "Xizhi" to a "nano brush" capable of intricately etching circuit designs on silicon substrates, enhancing the efficiency of chip design modifications without the need for traditional photomasks [5]. - The introduction of "Xizhi" addresses the long-standing issue of international export controls that have hindered domestic research and development in advanced semiconductor technologies, thus opening new market opportunities for companies like Huawei HiSilicon [5][6]. Collaborative Innovation Mechanism - The success of the "Xizhi" machine is part of a broader initiative combining technological and industrial innovation, facilitated by a collaborative framework involving Zhejiang University and local government [6]. - Although electron beam lithography currently has lower production efficiency compared to EUV lithography, its unique advantages in quantum chip development are irreplaceable, positioning "Xizhi" as a critical asset for advancing China's high-end semiconductor capabilities [6].