【深度】空白掩模版：光刻工艺的“底片”，国产化率几乎为零

Group 1 - The core viewpoint of the article emphasizes that the localization of photomasks is a crucial step for the self-sufficiency of the semiconductor industry in China [2][9][64] - Photomasks are essential materials in semiconductor manufacturing, with IC manufacturing accounting for 60% of the downstream market [2][12] - The global photomask market is projected to reach $6.079 billion by 2025, with a growth rate of 7% [4][26] Group 2 - The blank photomask is a core component of photomasks, with its production process involving multiple technical challenges and high barriers [5][50] - The global market for blank photomasks is expected to be around $1.8 billion in 2024, with the Chinese market estimated at $400 million [62] - Japanese companies dominate the blank photomask market, with HOYA holding a significant share in the EUV blank photomask segment [7][55] Group 3 - The article suggests that the localization of blank photomasks is urgently needed to reduce dependence on foreign suppliers and enhance the stability of the semiconductor supply chain [9][64] - Domestic suppliers are primarily focused on low-end applications, with high-end blank photomasks still reliant on imports from Japan and South Korea [60] - The increasing complexity of semiconductor processes necessitates a rise in the number of photomasks used, thereby increasing the demand for blank photomasks [32][33] Group 4 - Investment recommendations highlight the strategic importance of domestic photomask production to mitigate risks associated with international trade policies and supply chain uncertainties [64] - The acquisition of SK Enpulse by a domestic company aims to enhance capabilities in the blank photomask sector, aligning with national self-sufficiency goals [66][67]