光刻胶领域，我国取得新突破

Core Insights - Lithography technology is a key driver for the continuous miniaturization of integrated circuit chip manufacturing processes [1] - The research team led by Professor Peng Hailin from Peking University has utilized cryo-electron tomography to analyze the micro three-dimensional structure and entanglement behavior of photoresist molecules in a liquid phase environment [1][2] - This breakthrough allows for the development of industrial solutions that significantly reduce lithography defects, which is crucial for improving yield rates in advanced processes below 7 nanometers [1] Group 1 - The core step of lithography, "development," involves dissolving the exposed areas of photoresist with a developer solution to accurately transfer circuit patterns onto silicon wafers [1] - The movement of photoresist in the developer solution directly impacts the precision and quality of the circuit, thereby affecting chip yield [1] - Historically, the microscopic behavior of photoresist in the developer solution has been a "black box," limiting process optimization in the industry to trial and error [1] Group 2 - The introduction of cryo-electron tomography into the semiconductor field has enabled the synthesis of a micro three-dimensional "panoramic photo" with a resolution better than 5 nanometers [1] - This advancement overcomes three major pain points of traditional techniques: the inability to observe in situ, three-dimensional structures, and high resolution [1] - Mastering the structure and microscopic behavior of polymers in liquid can enhance defect control and yield improvement in key processes such as lithography, etching, and wet cleaning in advanced manufacturing [2]