光刻胶领域，我国取得新突破

Core Insights - The article highlights a significant breakthrough in the field of photoresists in China, particularly in the context of semiconductor manufacturing [1][2]. Group 1: Breakthrough in Photoresist Technology - A research team led by Professor Peng Hailin from Peking University has utilized cryo-electron tomography to analyze the microscopic three-dimensional structure and behavior of photoresist molecules in a liquid phase, which aids in developing industrial solutions to reduce photoresist defects [1]. - The core step of "development" in photolithography involves dissolving the exposed areas of photoresist with a developer solution, which directly impacts the precision of circuit pattern transfer onto silicon wafers and ultimately affects chip yield [1]. - The long-standing challenge of understanding the microscopic behavior of photoresists in developer solutions has been likened to a "black box," hindering the optimization of processes for advanced manufacturing nodes of 7nm and below [1]. Group 2: Technological Advancements - The introduction of cryo-electron tomography into the semiconductor field allows for unprecedented observation of liquid-phase reactions at the atomic/molecular scale, providing a powerful tool for understanding polymer structures and behaviors in liquid [2]. - Mastery of the structure and microscopic behavior of polymers in liquid can enhance defect control and yield improvement in critical processes such as photolithography, etching, and wet cleaning in advanced manufacturing [2].