重大突破！芯片，大消息！

Core Viewpoint - Recent advancements in China's semiconductor industry, particularly in photoresist technology, are expected to significantly enhance the manufacturing process and reduce defects in integrated circuits [2][3][5]. Group 1: Breakthrough in Photoresist Technology - A research team from Peking University has utilized cryo-electron tomography to analyze the micro-3D structure and behavior of photoresist molecules in liquid environments, leading to a new industrial solution that reduces lithography defects [2][3]. - The study revealed that traditional assumptions about photoresist behavior were incorrect, showing that most polymers are adsorbed at the gas-liquid interface rather than dispersed in the liquid [4]. - The research identified that aggregated particles, averaging about 30 nanometers in size, are potential sources of defects, which can lead to circuit patterns merging unintentionally [4]. Group 2: Market Growth and Demand - The photoresist market in China is projected to grow from approximately 109.2 billion yuan in 2023 to over 114 billion yuan in 2024, with expectations to reach 123 billion yuan by 2025 [2][6]. - The demand for semiconductor photoresists is increasing due to the rise of domestic semiconductor manufacturers and expanding downstream needs, accelerating the localization of mid-to-high-end products like KrF photoresists [6]. - The photoresist market has historically been dominated by international giants, but recent technological breakthroughs in China's semiconductor supply chain are changing this landscape [6]. Group 3: Importance of Lithography in IC Manufacturing - Lithography is the most time-consuming and challenging process in integrated circuit manufacturing, accounting for about 50% of the manufacturing time and approximately one-third of production costs [5]. - The quality of photoresist directly impacts the lithography process, which is critical for transferring circuit patterns onto silicon wafers [5]. - As integrated circuit feature sizes shrink, the requirements for photoresists are becoming increasingly stringent, necessitating advancements in resolution, contrast, and sensitivity [5].