我国芯片领域，取得新突破

Core Viewpoint - The research team from Peking University has successfully utilized cryo-electron tomography to analyze the micro-3D structure, interfacial distribution, and entanglement behavior of photoresist molecules in a liquid environment, leading to a significant reduction in lithography defects [1][4]. Group 1: Research Significance - The introduction of cryo-electron tomography in the semiconductor field allows for real-time, high-resolution observation of photoresist behavior in developing solutions, addressing the limitations of traditional methods [4][5]. - This advancement is expected to enhance defect control and yield improvement across various critical manufacturing processes in the chip industry, paving the way for the next generation of more powerful and reliable chips [5]. Group 2: Market Insights - The photoresist market in China is projected to grow from approximately 10.92 billion yuan in 2023 to over 11.4 billion yuan in 2024, with expectations to reach 12.3 billion yuan by 2025, driven by the acceleration of domestic substitution for mid-to-high-end products like KrF photoresists [5]. - Lithography is identified as the most time-consuming and challenging process in integrated circuit manufacturing, accounting for about 50% of the manufacturing time and approximately one-third of production costs [5]. Group 3: Domestic Equipment Development - The domestic lithography machine industry is progressing, although it still faces technological limitations compared to international standards, particularly in high-end lithography machines [7]. - The domestic supply chain for lithography machines includes upstream equipment and materials, midstream system integration and production, and downstream applications [7].