光刻胶领域，我国科学家取得新突破

Core Insights - The article discusses the advancements in photolithography technology, particularly the use of cryo-electron tomography to analyze the micro-3D structure of photoresist molecules in liquid environments, which can significantly reduce photolithography defects [2][3] Group 1: Photolithography Technology - Photolithography is a core driver for the continuous miniaturization of integrated circuit chip manufacturing processes [2] - The research team successfully synthesized a micro-3D "panoramic photo" with a resolution better than 5 nanometers, overcoming traditional technology limitations in real-time, three-dimensional, and high-resolution observation [2] Group 2: Research Implications - The introduction of cryo-electron tomography provides a powerful tool for analyzing various liquid-phase interfacial reactions at the atomic/molecular scale, which can enhance defect control and yield improvement in advanced processes such as photolithography, etching, and wet cleaning [3]