空白掩模版：光刻工艺的“底片”，国产化率几乎为零

Group 1 - The core viewpoint of the article emphasizes that the localization of photomasks is a crucial step for the self-sufficiency of the semiconductor industry in China [2][10] - Photomasks are essential materials in semiconductor manufacturing, with IC production accounting for 60% of the downstream market [2][11] - The global photomask market is projected to reach $6.079 billion by 2025, with a year-on-year growth of 7% [4][26] Group 2 - The blank photomask is a core component of photomasks, with its production process involving multiple technical challenges and high barriers [5][50] - The global market for blank photomasks is expected to be around $1.8 billion in 2024, with the Chinese market estimated at $400 million [62] - Japanese companies dominate the blank photomask market, with HOYA holding a significant share in the EUV blank photomask segment [7][55] Group 3 - The article suggests that the localization of blank photomasks is urgently needed to reduce dependence on foreign suppliers and enhance the stability of the semiconductor supply chain [9][64] - Companies like 聚和材料 are actively pursuing acquisitions to enter the blank photomask market, indicating a strategic move towards self-sufficiency [66][67] - The semiconductor photomask market is characterized by high technical barriers and significant capital requirements, making it challenging for new entrants [69]