Core Insights - ACM Research, Inc. has delivered its first Ultra Lith Baker system to a leading global display panel manufacturer, addressing challenges in advanced lithography such as process non-uniformity and critical dimension variation [1][3] - The Ultra Lith BK system features industry-leading UV curing uniformity of ±5% and advanced thermal management to enhance yield and process reliability [2][4] Company Overview - ACM Research develops and manufactures semiconductor process equipment, including solutions for cleaning, electroplating, and wafer-level packaging, aimed at improving productivity and product yield for semiconductor manufacturers [6][7] - The Ultra Lith BK integrates six cold plates for temperature uniformity of ±0.1°C and supports a configurable design with up to 32 hotplates, allowing flexibility in process recipes [4][6] Industry Context - The introduction of the Ultra Lith BK marks ACM's entry into the display panel segment, which has high-volume production capabilities and significant expectations for equipment performance [3] - As device geometries shrink, maintaining uniform process control in lithography is essential for consistent yield and device performance, highlighting the importance of innovations like the Ultra Lith BK [3]