Core Viewpoint - ACM Research, Inc. has launched its first Ultra Lith KrF track system aimed at enhancing front-end semiconductor manufacturing, which signifies the company's commitment to addressing lithography challenges in mature-node devices [1][3]. Group 1: Product Launch and Features - The Ultra Lith KrF track system expands ACM's lithography product line, offering high-throughput performance, advanced thermal control, and real-time process monitoring [1][3]. - The system features a flexible process module configuration with 12 spin coaters and 12 developers, supported by 54 hot plates for various temperature processing, achieving a throughput greater than 300 wafers per hour [3][2]. - The system incorporates proprietary backside particle removal unit (BPRV) technology to minimize cross-contamination risk and includes an integrated wafer-scale outlier inspection (WSOI) unit for real-time process variation detection [3][2]. Group 2: Market Position and Strategy - The launch reflects ACM's strategy to enhance its presence in front-end process equipment and to cater to the growing demand for mature-node devices, which are believed to represent a significant portion of global semiconductor output [3][2]. - By offering both ArF and KrF track systems, ACM aims to provide seamless fab integration and greater manufacturing flexibility across diverse applications [3][2]. Group 3: Company Overview - ACM Research, Inc. develops, manufactures, and sells semiconductor process equipment, including cleaning, electroplating, and packaging tools, aimed at improving productivity and product yield for semiconductor manufacturers [5].