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ASML麻烦了?英国电子束光刻机,绕过EUV,制造5nm芯片

Group 1 - The core viewpoint is that ASML dominates the photolithography market, holding over 80% market share, particularly in the high-end EUV lithography machines, which are essential for manufacturing chips below 7nm [1] - Global companies are seeking alternatives to bypass ASML's monopoly, especially regarding EUV technology, which could potentially reshape the semiconductor equipment landscape [3] - Various alternative technologies have been proposed, including Japan's NIL nanoimprint technology and the US's EBL electron beam technology, which are claimed to be capable of producing 5nm chips [5] Group 2 - The University of Southampton in the UK has announced the establishment of the first advanced electron beam lithography center with a resolution below 5nm, marking a significant development in chip manufacturing technology that does not rely on EUV machines [5][7] - The current electron beam lithography technology is limited to 200mm wafers (8 inches), with future advancements needed to support 300mm (12 inches) wafers [7] - If breakthroughs in electron beam lithography are achieved, ASML may face significant challenges, leading to a potential reshuffling of the current market dynamics [7]