Newway Photomask(SH:688401) Zheng Quan Shi Bao Wang·2025-07-07 05:52Core Viewpoint - The establishment of the "Xiamen Luwei Optoelectronics High Generation High Precision Photomask" project marks a significant step in China's display industry towards breaking foreign monopolies and achieving self-sufficiency in high-end photomasks [1][4]. Group 1: Project Overview - The project is located in the Xiamen Torch (Xiang'an) Industrial Zone and has a total investment of 2 billion yuan [1]. - It aims to develop and produce high-precision photomasks for G8.6 and below AMOLED/LTPO/LTPS applications, addressing the long-standing reliance on imports for high-precision photomasks in China [2][3]. Group 2: Industry Context - Photomasks are critical consumables in the precision manufacturing chain of the electronics industry, directly affecting the accuracy and quality of chips and display panels [2]. - The technology for photomasks has been dominated by Japanese and Korean companies, creating barriers for Chinese enterprises in the high-end product sector [2]. Group 3: Strategic Importance - Xiamen is a key part of Luwei Optoelectronics' national strategic layout due to its robust electronic information industry ecosystem and advantageous location [3]. - The project will establish 11 high-end photomask production lines, enhancing the supply chain resilience and security of China's display industry [3]. Group 4: Innovation and Future Prospects - The project is seen as an innovation engine, with plans for continuous R&D investment focused on high-precision photomasks [4]. - The first phase will include the construction of 5 production lines with an annual capacity of approximately 1,500 pieces, contributing to the global display industry [4][5].