阿斯麦：首台EXE:5200B High NA光刻机已发运

Core Insights - ASML has shipped its first TWINSCAN EXE:5200B High NA lithography system, indicating progress in the development and application of EUV lithography technology [1] Industry Trends - The investment in lithography machines continues to maintain a strong share of overall investments in wafer fabs, particularly in the DRAM sector [1] - The launch of the TWINSCAN NXE:3800E further solidifies the trend of increasing investment in lithography technology [1]