清溢光电(688138.SH)：正在推进130nm-65nm的PSM和OPC工艺的掩膜版开发和28nm半导体芯片所需的掩膜版工艺开发规划

Core Viewpoint - The company has successfully achieved mass production of semiconductor mask plates for the 180nm process node and small-scale production for the 150nm process node, while also advancing the development of mask plates for the 130nm-65nm PSM and OPC processes, as well as planning for the 28nm semiconductor mask plate development [1] Group 1: Semiconductor Mask Plate Technology - The company has achieved mass production of 180nm process node semiconductor mask plates [1] - Small-scale production of 150nm process node mask plates has been completed [1] - Development of mask plates for 130nm-65nm PSM and OPC processes is underway [1] - Planning for the development of mask plates required for 28nm semiconductor chips is in progress [1] Group 2: Flat Panel Display Mask Plate Technology - The company has successfully developed and mass-produced high-precision mask plates for 8.6 generation TFT [1] - The company has also developed mask plates for 6th generation mid-to-high precision AMOLED/LTPS [1] - Development and mass production of mid-to-high-end half-transparent membrane mask plates (HTM) have been achieved [1]