Group 1 - Jiangsu Weidao Nano Technology Co., Ltd. applied for a patent titled "A semiconductor production equipment and its control method, control device," with publication number CN120443149A, and the application date is May 2025 [1] - The patent describes a control method that includes obtaining the actual film thickness d of a substrate, calculating the difference between the actual film thickness d and the designed film thickness d0 to obtain the actual film thickness difference △d, and obtaining the actual temperature T in the reaction chamber [1] - The method further involves calculating the temperature difference △T, determining the first film thickness difference △d1 influenced by temperature, and calculating the second film thickness difference △d2 to adjust the flow rate of process gas for the next production cycle [1] Group 2 - Jiangsu Weidao Nano Technology Co., Ltd. was established in 2015 and is located in Wuxi City, primarily engaged in specialized equipment manufacturing [2] - The company has a registered capital of 457.678129 million RMB and has made investments in 2 enterprises, participated in 47 bidding projects, and holds 89 trademark records and 527 patent records [2] - Additionally, the company possesses 68 administrative licenses [2]
江苏微导纳米申请半导体生产设备及其控制方法等专利,提升产品的质量和良率