国林科技(300786.SZ)：半导体专用臭氧系统设备可以应用于光刻胶去除工艺

Group 1 - The core viewpoint of the article is that Guolin Technology (300786.SZ) has indicated its semiconductor-specific ozone system equipment can be utilized in the process of removing photoresist, which is an organic material [1] - Ozone plays a significant role in the removal of organic substances, highlighting its importance in semiconductor manufacturing processes [1]