冠石科技：目前40nm掩模板处于送样验证期

Core Viewpoint - Guanshi Technology is currently in the sample verification phase for its 40nm photomask, with an overall verification cycle of approximately 6-9 months [2] Group 1: Project Progress - The construction period for the photomask project is set at 60 months, and upon completion, it will have an annual production capacity of 12,450 semiconductor photomasks [2] - The company's professional team possesses extensive technical R&D experience, production management experience, and industry resources in the semiconductor photomask field [2] Group 2: Market Position and Impact - Once the photomask manufacturing project is operational, the company will become a leading independent photomask producer in China, filling the gap in advanced process photomasks domestically and breaking the foreign monopoly on high-end photomasks [2] - The Ningbo photomask project is focused on technology nodes ranging from 350-28nm, primarily targeting 45-28nm, which will accelerate the import substitution process in high-precision, low-line-width semiconductor photomasks [2]