我国芯片领域，取得新突破

Group 1 - The research team from Peking University has successfully utilized cryo-electron tomography to analyze the micro-3D structure, interfacial distribution, and entanglement behavior of photoresist molecules in a liquid environment, leading to a significant reduction in lithography defects [1][3] - The study addresses three major pain points in the lithography process, particularly the development step, which is crucial for accurately transferring circuit patterns onto silicon wafers [3][4] - The new method allows for in-situ, three-dimensional, high-resolution observation of photoresist behavior, overcoming limitations of traditional techniques [3][4] Group 2 - The implications of this research extend beyond the lithography field, providing a powerful tool for in-situ studies of various chemical reactions occurring in liquid environments, which could enhance defect control and yield improvement in semiconductor manufacturing [4] - The photoresist market in China is projected to grow from approximately 10.92 billion yuan in 2023 to over 11.4 billion yuan in 2024, with expectations to reach 12.3 billion yuan by 2025 [5] - The domestic photolithography machine industry is advancing, but still faces technical limitations compared to international standards, particularly in high-end photolithography technology [6] Group 3 - The domestic supply chain for photolithography machines includes upstream equipment and materials, midstream system integration and production, and downstream applications [6] - Various companies are making strides in specific technology areas related to photolithography, such as laser sources and optical lenses, indicating a growing capability within the industry [7]