对话半导体光刻专家庞琳勇博士：全芯片ILT是半导体向下迭代的关键技术

Core Insights - The article discusses the critical role of lithography technology in semiconductor manufacturing, particularly the challenges posed by the shrinking feature sizes of chips and the need for advanced correction techniques like Inverse Lithography Technology (ILT) [1][3]. Group 1: Lithography Technology - Lithography is essential for transferring integrated circuit patterns, facing challenges due to optical proximity effects as feature sizes decrease [1]. - Optical Proximity Correction (OPC) has evolved from rule-based to model-driven approaches, but traditional methods struggle with complex chip designs [1][3]. - ILT offers a new solution by mathematically reversing the lithography process, allowing for more precise compensation of optical distortions and etching effects [4][10]. Group 2: D2S, Inc and GPU Acceleration - D2S, Inc is a leader in GPU-accelerated solutions for semiconductor manufacturing, focusing on model-based processing technologies for nanoscale device fabrication [2]. - The introduction of GPU technology has transformed ILT from a theoretical concept to practical application, enabling full-chip processing that was previously limited by CPU capabilities [5][7]. - D2S's innovations, such as pixel-level dose correction (PLDC), enhance the accuracy and efficiency of mask writing processes [4][7]. Group 3: Market Trends and Future Outlook - The global market for computational lithography software is projected to grow from $1.268 billion in 2024 to $2.368 billion by 2031, driven by AI-enhanced solutions [9]. - AI is expected to complement existing technologies by optimizing model construction and accelerating ILT processes, thereby enhancing the overall efficiency of lithography [9][10]. - Full-chip ILT is seen as a foundational technology for future semiconductor generations, potentially enabling significant advancements in chip design and manufacturing processes [10][11].