路维光电：已实现180nm制程节点半导体掩膜版量产

Core Viewpoint - The company has achieved mass production of 180nm process node semiconductor masks and is progressing well in the production of 150nm/130nm masks, indicating strong capabilities in advanced semiconductor manufacturing [1] Group 1: Production Achievements - The company has successfully achieved mass production of 180nm process node semiconductor masks [1] - The 150nm and 130nm masks have passed customer validation and are in small batch production [1] - The company is positioned among domestic manufacturers in the production of 130-28nm masks, with ongoing progress in the 90nm and above semiconductor masks [1] Group 2: Future Plans - The company plans to initiate trial production of 40nm semiconductor masks in the second half of 2025 [1] - The project for the production of 130-28nm masks is progressing smoothly, indicating a strong pipeline for future production [1]