久日新材(688199.SH)：正在进行EUV光刻胶所需原材料光致产酸剂产品的开发

Core Viewpoint - The company is developing photoacid generators required for EUV photoresist materials, indicating a strategic move towards reducing reliance on imports in the semiconductor chemical materials sector [1] Group 1: Company Developments - The company is currently engaged in the development of photoacid generators for EUV photoresist materials [1] - The company’s semiconductor i-line photoresists, LED g-line/h-line photoresists, and diazonaphthoquinone-based photoresists are primarily dependent on imports [1]