中芯国际取得半导体结构、形成方法及掩膜版专利
Sou Hu Cai Jing·2025-12-09 04:21

Group 1 - The core viewpoint of the article highlights that Semiconductor Manufacturing International Corporation (SMIC) has obtained a patent for "semiconductor structure, formation method, and mask" with the announcement number CN114068558B, applied for in July 2020 [1] Group 2 - SMIC (Shanghai) was established in 2000, located in Shanghai, with a registered capital of 244 million USD. The company has made investments in 4 enterprises, participated in 127 bidding projects, and holds 150 trademark records and 5000 patent records, along with 446 administrative licenses [1] - SMIC (Beijing) was established in 2002, located in Beijing, with a registered capital of 100 million USD. The company has invested in 1 enterprise, participated in 53 bidding projects, holds 5000 patent records, and has 225 administrative licenses [1]

SMIC-中芯国际取得半导体结构、形成方法及掩膜版专利 - Reportify