Core Viewpoint - China is making unexpected progress in developing extreme ultraviolet (EUV) technology, with a prototype machine assembled using old ASML components, aiming to produce practical chips by 2028, although 2030 is seen as a more realistic target [2][4]. Group 1: Prototype Development - The prototype machine is expected to be completed by early 2025 and is currently undergoing testing, although it has not yet produced functional chips [2]. - The development of the prototype involved former ASML engineers who reverse-engineered the EUV equipment, highlighting the importance of their expertise in this project [3]. - The recruitment of these engineers was part of a talent acquisition initiative launched in 2019, offering substantial signing bonuses and housing subsidies [3]. Group 2: Role of Huawei - Huawei plays a central role in coordinating the EUV project, which is led by the Chinese government, involving a network of thousands of engineers from various enterprises and research institutions [4]. - Employees from Huawei have been deployed across different locations to support the project, often working under strict conditions due to the sensitive nature of the work [4]. Group 3: Technical Limitations - Despite the development of the EUV prototype, its technology is still significantly behind that of ASML, particularly in matching the ultra-precision optical systems produced by Western suppliers [5]. - The prototype is expected to utilize components subject to export restrictions from Japanese companies Nikon and Canon, further complicating its development [7].
据报道,中国利用较旧的ASML组件制造EUV原型机,Eyes 2028芯片制造