Group 1 - The State Intellectual Property Office of China has granted a patent to Semiconductor Manufacturing International Corporation (SMIC) for a method and system related to optical proximity correction, with the announcement number CN114879445B and an application date of February 2021 [1] - SMIC (Shanghai) was established in 2000, located in Shanghai, with a registered capital of 244 million USD. The company has made investments in 4 enterprises, participated in 127 bidding projects, and holds 150 trademark records and 5000 patent records, along with 446 administrative licenses [1] - SMIC (Beijing) was founded in 2002, located in Beijing, with a registered capital of 100 million USD. The company has invested in 1 enterprise, participated in 53 bidding projects, and also holds 5000 patent records, along with 225 administrative licenses [1]
中芯国际取得光学邻近矫正方法及系统专利