路维光电拟股价历史高位定增 2022上市两募资共14.5亿

Core Viewpoint - Lu Wei Optoelectronics (688401.SH) has reached a historical high in stock price, announcing a plan to issue A-shares to specific investors to raise up to RMB 138 million for various projects, including the construction of a high-precision mask production base in Xiamen and to supplement working capital and repay bank loans [1]. Fundraising Plan - The total planned investment for the Xiamen high-precision mask production base project (Phase I) is RMB 130,089.17 million, with RMB 107 million expected to be funded from the raised capital [2]. - An additional RMB 31 million will be allocated for working capital and bank loan repayment, bringing the total planned investment to RMB 161,089.17 million [2]. Issuance Details - The stock issuance will adopt a competitive pricing method, with the issue price set at no less than 80% of the average trading price of the company's A-shares over the 20 trading days prior to the pricing date [2]. - The number of shares to be issued will not exceed 57,750,180 shares, which is 30% of the total share capital after excluding shares held in the repurchase account [3]. Approval Process - The issuance plan has been approved by the company's board of directors and is pending approval from the shareholders' meeting, the Shanghai Stock Exchange, and the China Securities Regulatory Commission [3]. Shareholding Structure - As of the announcement date, the actual controller of the company, Du Wubing, holds 23.81% of the shares directly and controls an additional 7.61% through Lu Wei Investment [3]. - Following the issuance, Du Wubing's direct shareholding is expected to decrease to 20.43%, while maintaining control of the company [4]. Previous Fundraising - Lu Wei Optoelectronics previously raised RMB 83,600.67 million through an initial public offering (IPO), with a net amount of RMB 76,051.05 million after deducting issuance costs [5]. - The company had initially planned to raise RMB 40,505.26 million for various projects, including the expansion of high-precision semiconductor masks and the establishment of a research and development center [5].